Aimee Price, IMR Senior Research Scientist at Nanotech West Lab (NTW), along with fellow steering committee members Kevin Lister and Gerald Lopez, hosted the 3rd annual, one-day Meeting for Advanced Electron Beam Lithography (MAEBL) at The Ohio State University on Wednesday, April 3rd. This years meeting was supported by OSU’s IMR and by charter sponsors: JEOL USA, Raith Nanofabrication, STS-Elionix, AllResist, Genisys, and LatticeGear.
The workshop fosters the exchange of knowledge and experience of e-beam lithography (EBL) in the community. This growing community, although small and geographically scattered, is comprised of engineers, scientists, and students who use EBL for cutting-edge research and development.
EBL is the process of focusing an electron beam onto a film covered in an electron-sensitive material. The process changes the solubility of the film and allows the creation of precise nanostructures to be patterned onto the surface of the substrate.
Speakers at MAEBL this year came from The Ohio State University, University of Delaware, University of Pennsylvania, California Institute of Technology, Massachusetts Institute of Technology, Yale University, University of Washington, and Sandia National Lab.
NTW’s own electron beam lithography facilities include a Leica/Vistec EBPG 5000 field-emission electron beam pattern generator (EBL01) which can operate at 50 and 100 keV, using beam sizes as small as approximately 5nm, enabling linewidths down to approximately 20nm. NTW has CAD layout and data fracturing capability and can accept GDSII, Tanner Database CTEXT formats, and more.
The Institute for Materials and Manufacturing Research has an excellent overview of the MAEBL workshop. (https://imr.osu.edu/ohio-state-hosts-3rd-annual-maebl-workshop-for-users-of-e-beam-lithography-tools/)
For more information, contact Aimee Price (price.798@osu.edu) or another NTW staff member.
