Forming gas (5% H2 in N2) annealing is now available on furnace tube TUB01 for samples from small pieces up to 150 mm wafers and temperatures up to 790°C. Please contact Paul Steffen at steffen.8@osu.edu for details and to schedule processing.
The furnace tube has been converted from LPCVD polysilicon deposition to forming gas anneals. The LPCVD poly has been used very little in the last years; users who need polysilicon still have the option of sputtering in PVD03 or using electron gun evaporation in EVP01 or EVP03.
– Paul Steffen