Heidelberg Instruments MLA150
Nanotech West Lab (NTW) is pleased to announce the acquisition of an advanced maskless aligner (MLA150) from Heidelberg Instruments. In contrast to a traditional mask aligner, the MLA150 directly exposes electronic patterns onto the sample quickly with no contact and without the need to produce a physical mask. This system is capable of patterning features as small as 0.6 µm and includes the options for grayscale patterning and backside alignment. Samples up to 150mm x 150mm can be exposed.
The MLA150 is expected to arrive in January 2020 with the installation into Bay 2 of the cleanroom to follow in January and February. To accommodate the installation of the new MLA150, many changes to Bay 2 of the cleanroom will be occurring over the coming months. NTW staff will work to minimize the impact of these changes on the daily cleanroom operation but please bear with us as we work to prepare for and qualify this new system. We will do our best to notify users well in advance of any changes that will impact equipment access during this process.
A quick reminder for any users wanting to use the MLA150 once it is installed: The tool will require electronic copies of all mask patterns. If you are using legacy masks and currently do not have electronic pattern files, these will h ave to be reverse engineered and recreated.
For more information, please contact Dave Hollingshead (hollingshead.19@osu.edu) or another NTW staff member.
High-aspect ratio: Pillars. Resist: 160 μm SU-8 Image courtesy of Heildelberg brochure
High resolution mode: Vertical 500 nm lines and spaces. Resist: S1805. Wavelength: 375 nm