The Nanotech West Lab (NTW) has just completed the installation of a new Diener Pico(R) plasma asher. The asher, designated ASH01 in the NTW tool database, is located in Bay 3 of the cleanroom.
The asher vacuum system is completely oil-free, being pumped by a dry scroll pump. It fills a need of many users for a low-damage oxygen plasma clean of critical surfaces, especially for pre-metallization (gate and ohmic contact) semiconductor process steps. This is in part due to the fact that photo or electron beam lithography processes often leave small amounts of organic residue even in channels that appear (in optical microscopy) completely clean and developed. The tool is powered by a 13.56 MHz RF generator (0-50 W).
The tool has two input gas channels, but at the moment is only plumbed with pure oxygen.
While the tool is very easy to operate, a short training session is required; interested users should contact Pete Janney (janney.9@osu.edu) for a session.
Nanotech West will also soon complete the installation of a Plasma Therm 790 plasma-enhanced chemical vapor deposition (PECVD) tool. Gases plumbed to the tool will enable the deposition of high-quality, low-temperature silicon nitride and silicon oxide. Nanotech West users will receive a broadcast email when the tool is available.
The asher and PECVD were both purchased with capital funds from the Ohio Wright Center for Photovoltaics Innovation and Commercialization (PVIC), which in turn is funded by the Ohio Third Frontier Program of the Ohio Department of Development.