Nanotech West is pleased to announce the new gallium oxide-capable metal-organic chemical vapor deposition (MOCVD) system is now qualified and operational. This MOCVD (tool code CVD04) system was manufactured by Agnitron Technology of Minnesota and is specially designed for GaO and AlGaO epitaxy. CVD04 is capable of depositing on 50mm substrates at temperatures as high as 1050° C.
The Institute for Materials and Manufacturing Research has an excellent overview of this MOCVD. (https://imr.osu.edu/gallium-oxide-capable-mocvd-system-installed-at-nanotech-west-lab/)
For more information, contact NTW Director John Carlin (carlin.9@osu.edu) or another NTW staff member.
Gallium oxide-capable metal-organic chemical vapor deposition system (MOCVD)