Aimee L. (Bross) Price is a Senior Research Associate with the Institute for Materials Research and is the primary electron beam lithography engineer for the Ohio State Nanotech West Lab. Additionally, Aimee serves as the primary contact for process development support for both new and established Nanotech West cleanroom users. Aimee’s main tool responsibility is Nanotech West’s Raith/Vistec EBPG5000 electron beam lithography tool (EBL), including direct write EBL and photomask/stepper reticle fabrication. In addition to EBL, she is also responsible for the Zeiss Ultra Plus Field Emission SEM and the PicoSun Atomic Layer Deposition system.
Prior to her arrival at OSU in 2005, Ms. Price spent five years at TriQuint Semiconductor (now Qorvo) in Dallas, Texas, where she was a member of the electron beam lithography group in the Process Engineering Department. During that time, she was a primary member of cross functional engineering teams that improved DC yield across several product technologies. For her work on 0.25 micron PHEMT yield she received the TriQuint President's Award, the highest award given at the company.
Aimee's research interests include nanoscale lithography and patterning, nano-patterned epitaxy, and advanced surface analysis. Aimee was also previously employed by Molecular Electronics, Inc. of State College, PA. She holds a B.S. in Chemistry from The Pennsylvania State University, where she did surface chemistry research with the research groups of Paul Weiss and David Allara. She is currently working on an M.S. in Electrical and Computer Engineering at Ohio State in the Steven Ringel and Tyler Grassman research groups.