Our optical lithography capability includes a GCA 6100C I-line stepper, 2 EVG 620 Contact Aligners, and a Karl Suss MJB-3 Contact Aligner.  Processes available include:

  • I-line (365 nm) stepper photolithography (STP01) to linewidths of ~0.70 microns
  • Contact photolithography to ~2 microns (ALN01,ALN02, ALN03)
  • Standard Shipley 1813, 220, 955  positive tone resist processes
  • Both positive tone and image reversal processes for AZ5214
  • Shipley LOR2A and LOR5A bilayer processes for robust liftoff processes
  • Standard SU-8 negative resist processes