Nanotech West has an extensive set of material growth and deposition processes and tools available. They include:

  • Metalorganic chemical vapor deposition (MOCVD) of III-V materials, in the form of an Aixtron 3x2" close-coupled showerhead tool (CVD01) capable of growing (In, Al, Ga) (As, P, Sb) compound semiconductors on substrates up to 100mm
  • Electron gun evaporation of a wide variety of standard metals and some dielectrics (EVP01, EVP03)
  • RF and DC sputter deposition of a wide variety of metals and some dielectrics using a five-gun AJA Orion RF/DC load-locked sputter tool (PVD03)
  • Atomic layer deposition of dielectrics including HfO2, Al2O3, Ta2O5, ZnO, and TiO2 (other films possible with appropriate precursors) using a Picosun R-150B ALE ALD tool (ALD01)
  • Two LPCVD silicon nitride processes, stoichiometric and low-stress (TUB02)
  • PE-CVD silicon nitride and silicon oxide using a Plasma Therm 790 tool (CVD02)